On the importance of nucleation solutions for the rupture of thin liquid films

  1. Thiele, U.
  2. Neuffer, K.
  3. Pomeau, Y.
  4. Velarde, M.G.
Revue:
Colloids and Surfaces A: Physicochemical and Engineering Aspects

ISSN: 0927-7757

Année de publication: 2002

Volumen: 206

Número: 1-3

Pages: 135-155

Type: Communication dans un congrès

DOI: 10.1016/S0927-7757(02)00069-9 GOOGLE SCHOLAR
La source de données: Scopus